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Analytical equipment

Analytical services

Mixtures, phases, structures

Analytical technique

Application areas

Detection limits/ resolving power

Depth resolution

Sample size/ Lateral resolution

XRD

X-ray diffraction

Identification and quantification of crystalline compounds and phases

-

-

100 mg

IR

Infrared spectroscopy

Identification and analysis of polymers and organic compounds

400-4000 cm-1

0.1%

-

-

UV/VIS

Ultraviolet/visible spectrometry

Optical properties of films and liquids

200-800 nm

-

-

High pressure liquid chromatography

Liquid organic mixtures analysis

-

-

-

GC

Gas chromatography

Static and dynamic surface, pyrolysis, gas analysis

-

-

-

 Chemical composition

Analytical technique

Typical applications

Elements detected

Detection limits/ resolving power

Depth resolution

Sample size/ Lateral resolution

XRF

X-ray fluorescent spectrometry

Qualitative and quantitative elemental analysis of solids and liquids

From Na to U

0.001%

-

0.1 g

AAS

Atomic absorption spectrometry

Analysis of chemical composition

70 elements

0.00001%

-

0.1 mg

QMS

Quadrupole mass spectrometry

Analysis of chemical composition of gases

From He to Pt

10-10 Pa

(minimum detectable partial pressure)

-

-

XPS/ESCA

X-ray photoelectron spectroscopy /

Electron spectroscopy for chemical analysis

Surface analysis of inorganic and organic materials, depth profiling

Li-U

0.1-1 at %

submonolayer

1-10 nm

2 mm

ISE

Ion selective potentiometry

Detection of ions in liquids

About 15

0.01%

-

1 ml

OES

Optical emission spectrometry

Semiquantitative

analysis of metals

From Ti to U

0.01%

-

1-2 g

Electrical characteristics of devices, junctions and materials

Analytical technique

Application areas

Range

Resolving power

I-V

Current-voltage measurement device

Measurements of current-voltage characteristics of micro and optoelectronic devices and junctions

±1000 V

±2 A

-

C-V

Capacitance-voltage measurement device

Measurements of capacitance-voltage characteristics of micro and optoelectronic devices and junctions

±(0.001-100 pF)

±30 V

-

Measurements of microwave parameters

Testing of microwave devices; transmittance of materials in microwave range

12 - 78 GHz  
 

 

 

 

 

Other properties

Analytical technique

Application areas

Detection limits/ resolving power

Depth resolution

Sample size/ Lateral resolution

ED

Electron diffraction

Identification and quantification of crystalline compounds and phases of thin films

-

-

10 nm

SEM

Scanning electron microscopy

Surface morphology and structure

-

-

15 nm

BET

Brunauer-Emmet-Teller

surface  analysis

Measurement of surface of powder materials  by liquid nitrogen adsorption method

-

-

-

RIM/LE

Laser ellipsometry

Abbe refractometry

Measurement of thickness and refractive index of thin layers

0.5 nm

0.1

-

30 mm

OM/IP

Optical microscopy and image processing

Reflection, transmission, polarized, and phase contrast microscopy

x2000

-

-

DTA/TG

Differential thermal analysis/

Thermogravimetry

Temperatures and heat flow associated with transitions as function of temperature and time weight loss, crystallinity, purity, stability and glass transitions

20-1450 ºC

-

20-500 mg

Atomic Force microscopy

Atomic Force Microscope (AFM) is used for investigation of the surfaces of various materials

-

vertical:
0,1 - 0,2 nm;
lateral:
2 nm

-



Quadrupole Mass Spectrometer QUADRUVAC Q-200
It is a stationary gas analyzer with its own vacuum system, control and programmator of the masses. QUADRUVAC Q-200 operates on the principle of mass separation in high-frequency quadrupole field: the ion beam produced by electron collision in the ion source is accelerated and injected into the quadrupole separation system; by applying definitive separating voltage only the ions having definitive mass/energy ratio pass separation system. Pressure of the analyzed gas can range from atmospheric to 10-10 Pa. Range of the masses under analysis 1-200 atomic units, resolving power - 15 %. This device enables qualitative analysis and measurement of the total and partial pressure of the vacuum system during different technological process. Possible application areas include gas analysis and technological process quality control in research and industry.

Atomic Absorption Spectrometer Perkins Elmer Model 403
It is a simple double-beam spectrometer employing flame techniques. About 70 elements may be detected. Atomic absorption is a fast, simple analytical method that is especially useful when a small number of elements have to be determined in a large number of samples with moderate accuracy. This quantitative analytical technique has many applications particularly in the analysis of water, soil and stone samples. Due to simple exploitation, high speed and accurate analysis makes it one of the most popular methods for the determination of trace metals. Sensitivity of the method is about 0.05-0.1 ppm.
Fields of application: ecology, materials engineering, and medicine.

X-ray Fluorescence Spectrometer VRA-20
Wavelength-dispersive x-ray secondary-emission, or x-ray fluorescence spectrometry (XRFS), is a nondestructive instrumental method of qualitative and quantitative analysis for chemical elements based on measurement of the wavelengths and intensities of their x-ray spectral lines emitted by secondary excitation. The primary beam from an x-ray tube irradiates the specimen (sample or standard), exciting each chemical element to emit secondary spectral lines having wavelengths characteristic of that element (basis of qualitative analysis) and intensities related to its concentration (basis of quantitative analysis). The spectral lines are dispersed specially by crystal diffraction prior to detection. X-RAY Fluorescence Spectrometer enables to control elemental composition in different samples ranging from few ppm (parts per million) to few weight percent for most types of matrices for elements from Na to U. Complete range of related services including sample preparation and data formatting according to the client needs are proposed.
Typical application areas are: ecology, geology and mineralogy, metallurgy, mining and chemical industry, precious metals industry, mining, traffic and transportation, energy supply, machinery, agriculture, nutrition industry, forensic medicine, museums

Optical Emission Spectrometer Steel scope SL3
Atomic emission spectroscopy (AES or OES [optical emission spectroscopy]) employs quantitative analysis of the optical emission from the excited atoms to determine analytic concentration. This device is used for solid metals and alloys for the semi-quantitative analysis. Optical spectral range available for the analysis is from 200 to 800 nm. Typical applications include metals-alloys marking.
Ultraviolet and Visible Absorption Spectrometer SPECORD UV/VIS
UV-VIS spectroscopy is the measurement method based on the analysis of absorption spectra in ultraviolet and visible light region. Ultraviolet and visible light is energetic enough to excite outer electrons to higher energy levels. UV-VIS spectroscopy is usually applied to identity molecules and inorganic ions or complexes in solution. The UV-VIS spectra have broad bands that are of limited use for sample identification but are very useful for the quantitative measurements. Measuring the transmittance at some wavelength and applying the Ber-Lambert law can determine the concentration of the solvent in the solution.

Fiber optic UV/VIS/NIR Spectrometer AvaSpec-2048
 Spectrometer is based on the AvaBench-75 symmetrical Czerny-Turner design with 2048 pixel CCD detector array. It is a device for measuring light intensity in the UV, VIS and NIR regions. The AvaSpec-2048 is especially suitable for low light level and high-resolution applications. It is possible to use the spectrometer in the 172-1100 nm range. Resolution – 1.4 nm.

Infrared Spectrometer SPECORD 75 IR
Infrared (IR) spectroscopy is a powerful analytical tool for characterization and identification of vibration spectra of molecules and compounds. For example the IR spectrum of an organic compound serves as its fingerprint and provides specific information about chemical bonding and molecular structure. Using attenuated total reflectance (ATR), thin films can be analyzed directly on a substrate. We use the IR in precise determination of the chemical identity of organic contamination in a variety of samples including samples from the disk drive, biomedical, semiconductor, electronic, laser and optic industries. Analysis of polymers and plastics, liquids, solids, and gases and identification on the molecular level are available.

X-ray Photoelectron Spectrometer XSAM800 Kratos Analytical
The X-ray photoelectron spectrometer (XPS or ESCA) is versatile tool capable of providing qualitative and quantitative analysis of any vacuum compatible surface structure. It is based upon energy analysis of the spectra of electrons emitted from the surface irradiated by x-ray beam. Almost all chemical elements can be detected directly except hydrogen. However it is possible undirected detection of the hydrogen. Chemical bonding information can be determined from the chemical shift of atomic transitions. Information can be obtained from up to the 10 nm depth. Angle between the X-ray beam and sample can be changed in 30o-90o range. It enables nondestructive profiling of the surface. Deeper profiling can be performed using ion beam etching. Dual X-ray anode (Al/Mg) is used. X-ray energy - Mg Kα=1253.6 eV (line width at half height 0.7 eV), Al Kα=1486.6 eV (line width at half height 1 eV). Typical application areas are: analysis of surface structure of vacuum-compatible inorganic and organic materials: metals, semiconductors, dielectrics, polymeric films, etc.

Thermal Analysor Paulic, Paulic Erdey Mod.1500
Thermal Analysis (TA) includes a group of methods by which the physical and chemical properties of a substance, a mixture and/or reaction mixtures are determined as a function of temperature or time, while the sample is subjected to a controlled temperature program. The program may involve heating or cooling (dynamic), or holding the temperature constant (isothermal), or any combination of these. Thermal Analysator Paulic, Paulic Erdey Mod.1500 is designed for high temperature applications, allowing measurements to be carried out between 20°C and 1450°C. It can be equipped with different furnaces, thus facilitating the broad temperature range. Characteristics of the instrument are the extremely stable and reproducible TG and DTA baselines. The high degree of sensitivity of the DTA sensor is guaranteed even at temperatures above 1400°C. The electro magnetically compensated, top-loading microbalance stands out due to high accuracy and resolution in the µg range, as well as its excellent stability. Samples weighing up to 5 g can be tested. These features are the basis for the unique performance of this instrument. The high precision and excellent reproducibility make the Mod.1500 an imperative tool for research, development and quality assurance. Various thermal analytical techniques are provided by Laboratory and these include differential thermal analysis (DTA), thermogravimetry (TG) and differential thermogravimetry (DTG). These techniques are mainly used as tools for the identification of minerals and clay minerals in weathered rock, soils and clays and are complementary to the X-ray analytical techniques.
DTA: It is techniques by which the difference in heat flow to or from a sample and to or from a reference is monitored as a function of temperature or time, while the sample is subjected to a controlled temperature program.
Specific heat, melting temperatures, transition enthalpies, phase transformations, phase diagrams, crystallization temperatures, degree of crystallinity, glass transition temperatures, decomposition effects, reaction kinetics, purity can be investigated using this method.
TG: This is a technique by which the mass of the sample is monitored as a function of temperature or time, while the sample is subjected to a controlled temperature program.
Mass changes, decomposition temperatures, dehydroxilation, corrosion/oxidation, thermal stability, reduction studies, composition, reaction kinetics, purity can be investigated using this method.

Gas Chromatograph Chrome 5
Gas chromatography is a chromatographic technique that can be used to separate gas and volatile organic compounds. The gas chromatograph consists of an injection port, a separation column containing the stationary phase, and detector. The organic compounds are separated due to differences in their partitioning behavior between the mobile gas phase and the stationary phase in the column.
 

High Pressure Liquid Chromatograph MiliXrom02
High Performance Liquid Chromatography (HPLC) is a tool for quantifying and analyzing mixtures of chemical compounds. It's used to find the amount of chemical compound within a mixture of other chemicals. The sample dissolving in a solvent (like water or alcohol), thus the term LIQUID chromatography. A detector measures response changes between the solvent itself, and the solvent & sample when passing through it. The electrical response is digitized and sent to a data system.

X-ray Diffractometer DRON 3.0
 

X-ray powder diffraction runs are acquired on a Dron-3 X-ray Powder Diffractometer using Cu Ka radiation on a theta-2theta goniometer equipped with a germanium solid-state detector. Acquisition conditions are 35 kV and 30 mA. Scans are obtained typically from 10 to 70 degrees 2theta, with step size or integration range of 0.05 degrees 2theta, with a count time of 5 seconds. Raw diffraction scans are stripped of Ka2 component, background corrected with a digital filter, and peaks are identified using a variety of algorithms. Observed peak positions are matched against the ICDD JCPDS database.
The sample preparation step is important for a successful powder diffraction run. The sample should be ground to an approximately 100 µm powder; this is usually done in a mortar under acetone or isopropanol, and the sample is most easily loaded onto the 1 inch round glass disc while still a paste. A minimum of 100 milligrams is necessary for a good run, and although one can run with a smaller amount of sample it will require much longer count times to get good data.
Alternatively thin film on substrate can be used for the analysis. Taking in account the employed holder geometry, typical dimensions of the substrate should be: 2-5mm (thickness), (3-10)(width)x(15-25)(height) mm.

Surface and Pore Size Analysor Micromeritics M2100D
Single station analysis. Four probes simultaneously. Nitrogen adsorption and desorption isotherms. BET and Langmuir surface area. BJH pore size distribution analysis. Average pore volume, area, size and Total Pore Volume (TPV). Micro-pore analysis. BET (Brunauer-Emmet-Teller) method is based on adsorption of gaseous molecules on particles surface. The powder is evacuating and heating to about 200ºC, after that nitrogen or xenon is adsorbing in liquid nitrogen temperature. Surface of sample is calculating by Brunauer-Emmet-Teller equation. Applications: powders of inorganic materials, oxides, sorbents, catalysators

Ion Selective Electrodes (Potentiometer I-130M)
Potentiometry is electro analytical chemistry in which potential is measured under the conditions of no current flow. The measured potential may then be used to determine the analytical quantity of interest, generally the concentration of some component of the analyzed solution. It has been used to analyze metallic ions and anions in aqueous solutions. It is very simple method. It may be used to analyze in situ. (about 15 elements). Applications: analysis of the ocean water, river and stream water, wastewater, sludge, suspensions.

Scanning Electron Microscope JEOL JSM-IC25S
Microscope is used for analysis of structure and morphology of conductive and semiconductive surfaces. Analysis of the dielectric materials can be performed using special surface preparation. Principle of scanning electron microscopy is as follows: a focused electron beam is rastered over the sample surface from which an image is formed from the secondary electrons. Resolving power of a scanning electron microscope Joel JSM-IC25S reach up to 15 nm. Application areas of the microscope include: semiconductor device technology, vacuum coatings and thin films, mineralogy, biology, chemistry, etc.

Laser Ellipsometer Gaertner L-115
Laser ellipsometer is used for the measurements of thickness and refractive index of thin dielectric and semiconducting films. Laser elipsometry is based on the analysis of parameters of polarization of monochromatic polarized light beam reflected from the sample. Length of the light wave used is 632.8 nm. Thickness of films possible for analysis is 0.001 - 1 µm. Uncertainty of thickness measurements is ±(0.5 – 1) nm. Accuracy of the refractive index measurements ±0.01. Application areas: measurements of refractive index and thickness of the dielectric and semiconducting thin films, semitransparent thin metal films (< 50 nm), polymeric thin films (e.g. photo resist).

Micro Interferometer MII – 4
Micro interferometer is used for the measurements of thickness and surface roughness of thin opaque films. It is based on the phenomena of light interference. Range of measurements – (0.03 - 1.0) µm. Accuracy - ±(15-30) nm. Application areas of the interferometer include visual evaluation and measurement of the height of surface roughness, measurement of the vertical dimensions of microstructures.

Optical Analyzers Nikon S and Nikon N2
Optical analyzer Nikon (model S) is used for measuring of linear dimensions of the transparent structures in automatic mode with high fidelity (uncertainty of measurements do not exceeds (0.1+L/500) µm, where L is length of the structure under measurement). Enlargement of the optical analyzer x1200. Optical analyzer - comparator Nikon (model N2) with enlargement of x800 is used for measuring of linear dimensions of the structures using transmitted or reflected light mode. This analyzer - comparator is especially useful when measuring a step error of planar topology. Possible application areas include: photo mask control, step error, semiconductor wafer control.

Image Analysis Techniques
The analysis of particles from both a qualitative and quantitative aspects must include image analysis techniques. Image analysis is also a powerful tool for the measurement and characterization of many biological and natural materials. The imaging systems facility is closely related to the laboratory and runs various packages for image analysis (e.g. Scion Image), graphics processing and modeling (e.g. Photoshop, Surfer). Analytical facilities and processing software can be tailored to individual project needs and to date work has been done on satellite image processing, quantification of scanning electron microscopy images, routine digital photography.

Equipment for Measurements of Microwave Parameters
Measurements of the transmission and reflectivity of microwaves in the frequency range 12 - 78 GHz are carried out in the waveguides using panoramic meters of standing wave factor P2-65, P2-66, P2-67, P2-68 and P2-69.

Atomic Force Microscope NT-206
Atomic Force Microscope (AFM) is used for investigation of the surfaces of various materials. It supports operations in the following modes: Static (including contact mode (of topography) and lateral force microscopy), Dynamic (including non-contact and intermittent/analogous to Tapping Mode®/ mode), Static/ Dynamic force spectroscopy. Characteristics of the AFM: maximum scan field area: up to 30x30 microns; measurement matrix up to 512x512 points and more; maximum range of measured heights: 4 microns; lateral resolution: 2 nm, vertical resolution: 0.1 - 0.2 nm;

Scratch Tester
The adherence and hardness of thin coatings can be measured with the PC controlled scratch tester. During the scratch test the sample is scratched with an indenter applying the increasing normal force (load). The displacement of the indenter, normal force and the occurring tangential (frictional) force are recorded in real time. Sharp increase of the tangential force pinpoints the spot on a scratch track where the coating destruction begins. Knowing that spot the critical normal force where destruction of the coating takes place can be acquired from the scratch diagram.

Afterwards the sample is photographed under optical microscope to determine the type of scratch-induced defects as well as the width of scratch track. When scanning a scratched sample with AFM it is possible to determine the depth of the scratch track. After relating normal force, and the width or the depth of the scratch track, it is possible to determine the hardness of the coating. Comparing the critical normal forces of coating destruction one can compare the adherence of several samples. It is possible to evaluate the friction coefficient between the known indenter and the surface of the coating as well. There are 3 construction vertions for measuring with the corresponding maximal loads and accuracies:

 

Normal force, N

Tangential force, N

I

0,340±0,009

0,070±0,002

II

3,50±0,07

0,180±0,005

III

5,40±0,12

2,30±0,05

 Minimal length of the scratch sample is 15mm.

Surface Roughness Tester TR200
TR200 is a portable roughness instrument. This instrument applies to production site and can be used to measure surface roughnesses of various machinery-processed parts (compatible with standards ISO, DIN, ANSI, and JIS), calculate corresponding parameters according to the selected measuring conditions and clearly display all measurement parameters and profile graphs on LCD or on monitor of computer.

Technical specifications
Roughness parameters
Ra, Rz, Ry, Rq, Rt, Rp, Rmax, Rv, R3z, RS, RSm, RSk,Rmr, Primary profile (P), compatible with standards ISO, DIN, ANSI, and JIS.
Measurement range: 160 mm, resolution up to 0.01 mm
Cutoff length 0.25mm / 0.8mm / 2.5mm
Pick-up Diamond tip radius 5μ, probe angle 90º
Data output RS232; direct to printer or PC
Digital filter RC, PC-RC, Gauss, D-P
Power Li-ion battery rechargeable
Charger 220V / 110V, 50Hz, 2.5 hours (charging time)
Working temperature 0 - 40 ºC
Dimensions 141mm×56mm×48mm
Weight 480 g

 

©2011